Published: Nov. 7, 2016 By

AVS2016The annual American Vacuum Society (AVS) Symposium is being held this week. The conferenceÌýstartingÌýyesterday, Nov. 6th,Ìýand runningÌýthrough Friday, Nov. 11th, is being held in Nashville, TN, also known as Music City, USA. Several George group members will be in attendance, giving talks at the symposium. A schedule of group member talks follows.Ìý

Steve George will be giving a talk on Tuesday at 8:20 am in the Thin Film Advanced ALD Processsing session ³Ù¾±³Ù±ô±ð»åÌýGrowth of Silicon Films at Room Temperature Using Electron Enhanced Atomic Layer Deposition. This work was primarily headed by 5th year graduate student Jaclyn Sprenger.ÌýSteve will be giving a second talk during this session ³Ù¾±³Ù±ô±ð»åÌýSpatial MLD of Polyamide Films on Flexible Substrates using a New Rotating Cylinder Reactor in a Custom OvenÌýat 11:40 am. This work was primarily headed by former graduate student and postdoc Daniel Higgs.Ìý

During the Thin Film session on Photovoltaics, postdoc Diane LancasterÌýwill be giving a talk on her work, ³Ù¾±³Ù±ô±ð»åÌýControlling the Composition of Zn(O,S) Alloys Grown by Atomic Layer Deposition, at 5 pm on Tuesday.

Finally, on Wednesday during the Thin Film Atomic Layer Etching session, postdocÌýAmy Marquadt and graduate studentÌýNicholas JohnsonÌýwill be giving talks at 11:40 am and 12 pm, respectively. Amy's talk is on the Conformality of Thermal Al2O3ÌýAtomic Layer Etching in High Aspect Ratio Structures. Nick's talk is onÌýThermal Atomic Layer Etching of Crystalline Aluminum Nitride Using Sequential, Self-Limiting HF and Sn(acac)2ÌýReactions and Enhancement by H2Ìýand Ar Plasmas.

Find more information about the conference, and abstracts for these talks . Look for us at AVS 2016!

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